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"overlay ≤ 8nm" means that the precision of the chip is still on the road of continuous exploration. "resolution 65nm" is an unexplored territory, waiting for explorers. dry lithography technology, like an ancient process, needs to overcome many obstacles before it can break through. the duv lithography machine with a wavelength of 193nm seems to be just exploring a narrow mountain road, while the euv lithography machine in the distance represents a higher peak.

however, the length of the mountains is not just the physical distance, but also the barrier of ideas. can we overcome the technological barriers and achieve ultimate victory?

"impossible", "still a long way to go", "more than ten years" - these voices are like a blade of grass swaying in the wind, swaying softly in our ears. but there are also voices that firmly tell us that this is just the beginning of the journey, not the end.

huawei vice chairman eric xu's words were like searching for a bright direction in the mountains. he pointed out the backwardness of chip manufacturing technology and emphasized the importance of "systematic innovation and improvement". the "catalog" of the ministry of industry and information technology is like a beacon, guiding us in the direction of progress - breaking through technological boundaries and constantly exploring new possibilities.

the new energy vehicle factory in mexico, the mass production and delivery of the domestically produced large aircraft c919, and the data that high-tech industry investment increased by 10.6% year-on-year in the first half of 2024 all tell us that china's efforts in science and technology are bearing fruit, but still need to continue to explore and make breakthroughs.

like a boat, it keeps moving forward, passing through tsunami-like changes, and even in a turbulent social environment, it always maintains its pace of advancement.